Measurement Methods for Process Control
Process control systems for the manufacture of semiconductors are essential for maintaining tight control over many batches and different dyes, ensuring high device performance and yield. Process control equipment may involve different measurement methods, such as ellipsometry, scatterometry, interferometry, and imaging. Laser light manipulation can be easily achieved using diffractive optics, allowing for accurate and close projection to the wafer. This enables high detection rates and optimal manufacturing process control.
Holo/Or designs and produces micro-optics multi-spot and beam shaper elements to facilitate efficient and precise beam splitting and shaping, thereby increasing the probability of defect detection. Send over your inquiry.
About Holo/Or
Holo/Or develops, designs and manufactures diffractive optical elements (DOEs) and micro-optical elements for any wavelength, from DUV to far IR, as well as software/automation solutions for the design. Holo/Or’s products include:
If you are interested in DOEs for your application, contact Holo/Or.
